Boğaziçi CT3
Device Name / Brand / Model
• Name: Photolithography Spin Coater and Hot Plate System (Pre-bake / Post-bake)
• Brand: BREWERSCIENCE
• Model: —
Overview
This system is used to perform key photolithography steps such as photoresist spin coating, pre-bake, and post-bake processes. The Brewer tool is controlled via a touchscreen interface running the Windows operating system, enabling user-friendly process control and parameter management. (Note: The system status is tracked as “In operation”.)
Purpose / Output
• Controlled photoresist spin coating for thin-film/resist deposition
• Pre-bake and post-bake steps to stabilize and condition resist film properties
• Repeatable lithography workflows via recipe-based process control
• Compatibility with a wide sample/wafer size range (10–200 mm)
Application Areas
• Photolithography workflows (resist coating, pre-bake, post-bake)
• Surface coating and thermal processing steps for micro/nanofabrication
• Wafer/sample preparation and process standardization
Highlights
• High-capacity recipe management (up to 250,000 recipes)
• Flexible coating conditions with a 0–6000 rpm spin-speed range and high acceleration capability
• Temperature range from ambient to 300°C with 0.3°C temperature stability across the entire work surface
Technical Specifications
| Feature | Value / Description |
|---|---|
| Recipe capacity | 250,000 |
| Spin speed range | 0 – 6000 rpm |
| Acceleration range | 0 – 30,000 rpm/s |
| Spin speed repeatability | < 0.2 rpm |
| Spin speed resolution | < 0.2 rpm |
| Usable sample size | 10 – 200 mm |
| Temperature resolution | 0.1 °C |
| Temperature range | Ambient – 300 °C |
| Temperature stability | 0.3 °C across the entire work surface |
| Control | Touchscreen interface running Windows OS |
| Usage note | In operation |
Contact / Service Request
For service requests: you may email [email protected]. (Please specify the sample type, purpose, and preferred date range.)
