Device Name / Brand / Model
• Name: Wet Bench System (Chemical Cleaning / Etching / Photoresist Development)
• Brand: ARİAS
• Model: —

Overview
This system is designed for use at the wet benches in the lithography room to perform a wide range of chemical cleaning and etching processes, with a primary focus on developing exposed photoresist. After processing, samples are rinsed with continuously supplied DI (deionized) water and dried with nitrogen (N₂) gas. The bench also includes two hot plates and one spinner, supporting key steps in lithography workflows.

Purpose / Output
• Development of exposed photoresist
• Chemical cleaning and surface preparation processes
• Chemical etching workflows
• Rinsing with DI water and drying with N₂ to reduce contamination
• Thermal processing support via hot plates (e.g., soft bake / hard bake steps)
• Process support via an integrated spinner (e.g., resist coating-related workflows)

Application Areas
• Photolithography processes (resist development and surface preparation)
• Chemical cleaning steps before/after micro/nanofabrication
• Surface modification and process preparation via etching
• Wafer/sample preparation workflows in cleanroom environments

Highlights
• Continuous DI water rinse and N₂ drying for controlled, clean processing
• Two integrated hot plates supporting thermal process steps
• Integrated spinner enabling compatibility with lithography workflows

Technical Specifications

Contact / Service Request
For service requests: you may email [email protected]. (Please specify the sample type, purpose, and preferred date range.)